光学学报, 2003, 23 (11): 1359, 网络出版: 2006-06-27
亚波长消反射光栅
Design and Fabrication of Subwavelength Antireflection Gratings
物理光学 二元光学 等效介质理论 二维光栅 亚波长结构 binary optics equivalent medium theory two-dimensional grating subwavelength structure
摘要
为了降低消反射光栅的偏振敏感性,将等效介质理论推广到二维亚波长结构,对一种特定的矩形柱状结构进行了分析。构造了一种分析方法,然后利用光栅结构的有关表达式得到这种二维结构的近似等效系数。并设计了适用于10.6 μm红外波段的二维亚波长消反射光栅,用二元光学的制作工艺在Si衬底上进行了实验制备。测试结果表明:对中心波长为10.6 μm的红外光,这种光栅象单层消反射膜一样,具有很好的增透效果。
Abstract
To reduce the polarization sensitivity of antireflection gratings, a particular rectangular structure was analyzed by genexating equivalent medium theory(EMT) to two-dimensional subwavelength structure. An approximate equivalent coefficient for two-dimensional subwavelength was obtained with the related expressions of grating structure. A two-dimensional subwavelength antireflection grating designed for 10. 6 μm was fabricated on a Si substrate by using binary optical processing. The results show that this grating st ructure was similar to a single antireflection film at 10. 6 μm.
陈四海, 程志军, 黄光, 何苗, 易新建. 亚波长消反射光栅[J]. 光学学报, 2003, 23(11): 1359. 陈四海, 程志军, 黄光, 何苗, 易新建. Design and Fabrication of Subwavelength Antireflection Gratings[J]. Acta Optica Sinica, 2003, 23(11): 1359.
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