用简并四波混频技术(DFWM)研究了nc-Si:H薄膜的三阶非线性光学性质，观察到了这种纳米薄膜材料的位相共轭信号，测得晶态比为XC1=15%和XC2=30%的二个样品在光波波长为589nm处的三阶非线性极化率分别为χ1(3)=3.8×10-6esu和χ2(3)=4.3×10-7esu，并对其光学非线性产生机理作了探讨。

By using degeneratefour-wave mixing, the third-order nonlinear optical properties of nc-Si:H thin films were investigated.The phase conjugation signal was observed, and the third-order nonlinear susceptibilitiesat 589 nm for the volume fraction XC1=15% and XC2=30% of thecrystalline in the samples are χ1(3)=3.8×10-6 esu and χ2(3)=4.3×10-7esu, respectively. The nonlinear machanism of the material was discussed.