红外与激光工程, 2001, 30 (1): 66, 网络出版: 2006-04-28
X射线衍射、X射线光电子能谱对PtSi薄膜形成机理的研究
Study on the formation mechanism of PtSi film by X-ray diffraction and X-ray photo spectrum
摘要
促使物相尽可能地向Pt2Si和PtSi转化，是PtSi薄膜工艺研究中的重要工作。文中通过用X射线衍射(XRD)、X射线光电子能谱(XPS)微观分析手段对PtSi薄膜形成物相分步观察，研究了长时间变温退火、真空退火以及真空和保护气体(N
Abstract
It is very important forformation of PtSi thin film to make the phases of thin film change into Pt
刘爽, 宁永功, 陈艾, 龙再川, 杨家德. X射线衍射、X射线光电子能谱对PtSi薄膜形成机理的研究[J]. 红外与激光工程, 2001, 30(1): 66. 刘爽, 宁永功, 陈艾, 龙再川, 杨家德. Study on the formation mechanism of PtSi film by X-ray diffraction and X-ray photo spectrum[J]. Infrared and Laser Engineering, 2001, 30(1): 66.
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