强激光与粒子束, 2001, 13 (5): 654, 网络出版: 2006-05-15
强流脉冲电子束二极管等离子体漂移速度的研究
Investigation of plasma drift velocity vs time in intense electron beam diode
摘要
强流相对论电子束二极管阴阳极等离子体的形成和漂移,是二极管工作状态研究的重要组成部分。根据Child-Langmuir定律和二极管导流系数,结合二极管阴极电子发射面积的变化模型,给出了二极管阴阳极等离子体漂移所导致的阴阳极间隙闭合速度
Abstract
The forming and drifting of plasma in the intense electron beam diode is one of the important issues in studying the diode's operation.In this paper,based on the Child Langmuir law and conduction coefficient of the cool cathode diode,it is suppose that the cathode emission area of intense electron beam diode is variable.The drift velocity of the plasma in the diode is studied with experimental data of FLASH Ⅱ accelerator.The result shows that the drift velocity of plasma is variable with time.The qualitative analysis about this velocity presents the closing speed of the gap between the diode's two poles and also fully explains the plasma's movement while the diode is on.
彭建昌. 强流脉冲电子束二极管等离子体漂移速度的研究[J]. 强激光与粒子束, 2001, 13(5): 654. 彭建昌. Investigation of plasma drift velocity vs time in intense electron beam diode[J]. High Power Laser and Particle Beams, 2001, 13(5): 654.