应用光学, 2001, 22 (5): 43, 网络出版: 2006-05-19
纳米TiOx光学薄膜的制备及性能分析
PREPARATION AND CHARACTERISTIC OF NANOMETER TiOx OPTICAL THIN FIL
摘要
报道用常压化学汽相沉积(APCVD)工艺制备TiOx纳米光学薄膜的研究结果,分析衬底温度对薄膜结构及折射率的影响,讨论在抛光硅片及绒面硅片上制备的TiOx薄膜光学减反射特性,并优化了工艺条件.
Abstract
This paper reports some investigation results of nanometer TiOx optical thin film prepared by atmospheric pressure chemical vapor deposition(APCVD),analyzes the influence of temperature on constructure and refractive index of TiOx,the antireflection characteristics of TiOx deposited on polished wafers and textured wafers are dicussed,the optimal process is proposed.
王鹤, 杨宏. 纳米TiOx光学薄膜的制备及性能分析[J]. 应用光学, 2001, 22(5): 43. 王鹤, 杨宏. PREPARATION AND CHARACTERISTIC OF NANOMETER TiOx OPTICAL THIN FIL[J]. Journal of Applied Optics, 2001, 22(5): 43.
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