畸变特性是光刻物镜的关键指标,目前少有报道,提出了一种大视场投影光刻物镜畸变测量原理,测量系统和测量数据的处理方法.利用该装置对研制的口径6英寸,分辨率3 μm的物镜进行了测量,得出该物镜在全视场的畸变值小于2.0 μm.

Distortion is the key index of lithography lens system, but there is no much reports about it. This paper presents a new theory and system about distortion detect, and a new method about how to process the detected data. A new 6-inch dimension, 3 μm resolution large field projection lithography lens was detected with this system and the results is that the distortion of this lithography lens is less than 2.0 μm in all field.