光子学报, 2005, 34 (3): 477, 网络出版: 2006-06-12
离子辅助沉积中离子束流密度的作用
The Effect of ion Current Density in ion Beam Assisted Deposition
摘要
测量了End-Hall离子源在不同条件下的离子束流密度,在不同离子束流密度下进行了Ar离子辅助沉积ZrO2薄膜的实验,研究了离子束流密度对薄膜折射率、晶相的影响.根据动量传递模型分析了离子束流密度对薄膜折射率的作用;根据热尖峰理论证明了一定条件下离子束流密度不会影响薄膜晶体结构.
Abstract
The ion current density (ICD) of End-Hall ion source at different conditions were determined with a Frady cup. The ZrO_2 films were deposited with different Ar+ ICD. The influence of ICD on refractive index, crystal phases, index inhomogeneity of films was studied. The effect of ICD on refractive index was analysed by a momentum transfer model. According to a thermal-spike theory, it is evidenced that the ICD didn′t influence the crystal structure of the films.
张大伟, 洪瑞金, 范树海, 王英剑, 邵建达, 范正修. 离子辅助沉积中离子束流密度的作用[J]. 光子学报, 2005, 34(3): 477. 张大伟, 洪瑞金, 范树海, 王英剑, 邵建达, 范正修. The Effect of ion Current Density in ion Beam Assisted Deposition[J]. ACTA PHOTONICA SINICA, 2005, 34(3): 477.
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