Chinese Optics Letters, 2004, 2 (1): 0104, Published Online: Jun. 6, 2006
Laser writing system for fabrication of diffractive optics elements Download: 673次
Abstract
We report a laser writing system for fabrication of diffractive optical elements with He-Cd laser. The wavelength of the light source is 441.6 nm. The output beam is collimated into parallel light with uniform intensity distribution after passing through the spatial filter with a pinhole of 25 um and the collimating device. A microscopy objective lens with numerical aperture (NA) of 0.65 is used to focus the beam into a small diffraction spot. Any pattern can be written with this system. Experimental results are presented. The written gratings and the phase patterns were verified with a conventional optical microscopy and the Taylor Hobson equipment.
Xiaohui Sun, Changhe Zhou, Huayi Ru, Yanyan Zhang, Bingkun Yu. Laser writing system for fabrication of diffractive optics elements[J]. Chinese Optics Letters, 2004, 2(1): 0104.