中国激光, 1996, 23 (10): 893, 网络出版: 2006-12-04
离子束溅射铂膜沉积速率的温度效应
Deposition Rate of IBS Deposited Pt Films at Different Substrate Temperatures
摘要
实验研究了离子束溅射铂膜的沉积速率与溅射功率、基片温度之间的关系。结果表明基片温度对沉积速率有明显的影响.沉积速率随基片温度的上升而增大。利用吸附理论对此现象进行了探讨。
Abstract
The investigation of the paper includes the measurements of the deposition rate ofPt films deposited by ion- beam sputtering at different deposition parameters andtemperatures. It was found that deposition rate increases with the increase of the substratetemeperature. Using the physical and chemical adsorption theory, we discussed thisphenomenon.
邵建达, 范正修, 王润文. 离子束溅射铂膜沉积速率的温度效应[J]. 中国激光, 1996, 23(10): 893. 邵建达, 范正修, 王润文. Deposition Rate of IBS Deposited Pt Films at Different Substrate Temperatures[J]. Chinese Journal of Lasers, 1996, 23(10): 893.
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