Collection Of theses on high power laser and plasma physics, 2005, 3 (1): 1577, Published Online: Jun. 1, 2007
Moistureproof Film of Polymeric (CH3)2Si(OC2H5)2 on Phosphate Laser Glass
薄膜光学 溶胶凝胶 有机硅 防潮膜 激光破坏阈值 thin films optics sol-gel organic silicon moistureproof film laser-damaged threshold value
Abstract
(CH3)2Si(OC2H5)2 as precursor, a sol of good stability is prepared by sol-gel method and organic synthesization. After the sol is coated it on phosphate laser glass by rotating way, moistureproof film is worked out, having a transmittance of 96.5% after heated. The film has a good morphology, roughness of mean square (RMS) of 1.659 nm and roughness of average (RA) of 1.321 nm. The damaged threshold of the moistureproof film is high to 10～14 J/cm2, tested by a laser of wavelength of 1053 nm and pulse width of 1 ns. In the period of 5 years on “Shenguang Ⅱ” high power laser equipment, it behaves good moistureproof performance , and tryouts on “Shenguang Ⅲ” model.
Ruijun Liu, Haiyuan Li, Yongxing Tang, Jianqiang Zhu. Moistureproof Film of Polymeric (CH3)2Si(OC2H5)2 on Phosphate Laser Glass[J]. Collection Of theses on high power laser and plasma physics, 2005, 3(1): 1577.
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