光学学报, 1995, 15 (9): 1254, 网络出版: 2007-08-17
C60薄膜的准分子激光刻蚀及形貌分析
Excimer Ultraviolet Laser Ablation of C60Films and Its Morphology Analysis
摘要
报道了准分子XeCl(308 nm)紫外激光刻蚀C60膜的实验研究及对刻蚀薄膜的形貌分析。基于形貌分析的结果提出其刻蚀机理。
Abstract
In this paper, experimental study on excimer XeCl (308 nm) ultraviolet laser ablation of C60 films and their morphology analysis are reported. A possible mechanism is presented on the basis of the morphology analysis.
谢燕燕, 吴正亮, 宁东, 楼祺洪, 李缙, 曹基文. C60薄膜的准分子激光刻蚀及形貌分析[J]. 光学学报, 1995, 15(9): 1254. 谢燕燕, 吴正亮, 宁东, 楼祺洪, 李缙, 曹基文. Excimer Ultraviolet Laser Ablation of C60Films and Its Morphology Analysis[J]. Acta Optica Sinica, 1995, 15(9): 1254.