选择性氧化工艺已经成为制备高性能垂直腔面发射激光器(VCSEL)的关键技术,氧化后形成的氧化层提供了良好的电限制和折射率导引,但选择性氧化速率是呈线性规律还是抛物线规律仍存在很大的争议。在多种温度条件下,做了环形沟槽和环形分布孔的氧化实验,这是在垂直腔面发射激光器中采用的两种结构。实验结果表明,氧化窗口形状对氧化速率的影响也依赖温度条件,并对这种实验现象给出了定性解释。

Selective oxidation has evolved into a key technology in fabrication of high-performance vertical cavity surface emitting lasers (VCSELs). The oxide layers have been pursued to form current apertures and index guiding. However, there exists considerable controversy whether the selective oxidation follows a linear or parabolic growth rate. Oxidation experiments have been done at different temperatures for the two ring groove and perforated ring mesa structures employed in VCSEL. Results show the influences of geometry of mesa structures on the oxide growth rate depend on temperature. Reasonable theoretical analysis is given.