激光与光电子学进展, 2007, 44 (8): 57, 网络出版: 2007-09-05
激光化学气相沉积法制备TiO2薄膜
Preparation of Titanium Dioxide Films by Laser Chemical Vapor Deposition Method
功能材料 二氧化钛 激光化学气相沉积 薄膜 functional materials titanium dioxide laser chemical vapor deposition thin films
摘要
利用激光化学气相沉积(LCVD)方法，以钛金属有机化合物为前驱体，以O2为反应气体，在激光功率PL为0～200 W、基板预热温度为400～700℃的条件下，制备出了金红石型TiO2薄膜和金红石型与锐钛矿型混合TiO2薄膜。研究表明，激光功率和基板预热温度对所沉积的TiO2薄膜的物相组成、截面组织，表面形貌和薄膜生长速度均有着显著的影响。
Abstract
Rutile TiO2 films and rutile-anatase-mixed TiO2 films were prepared by Laser Chemical Vapor Deposition at laser power between 0 to 200 W and at substrate pre-heating temperature between 400 to 700℃ at the presence of O2. The results showed that the deposited films' crystalline phases, cross-sectional texture, surface morphology and deposition rates were mainly affected by laser power and substrate pre-heating temperature.
孙利平, 邓辉球, 刘晓芝, 佘彦武, 黄飞江. 激光化学气相沉积法制备TiO2薄膜[J]. 激光与光电子学进展, 2007, 44(8): 57. 孙利平, 邓辉球, 刘晓芝, 佘彦武, 黄飞江. Preparation of Titanium Dioxide Films by Laser Chemical Vapor Deposition Method[J]. Laser & Optoelectronics Progress, 2007, 44(8): 57.
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