利用电子束热蒸发镀膜的方式，以高纯度的ZnO和TiO₂颗粒为原料，以Si为基底在有氧的气氛中制备ZnO／TiO₂复合薄膜。研究制备温度对ZnO／TiO₂薄膜的结构以及发光性能的影响。通过拉曼(Raman)谱和X射线衍射(XRD)谱分析了ZnO／TiO₂薄膜的结构，表明所制备的ZnO薄膜为非晶态。用光致发光(PL)谱表征了它的发光特性，数据表明在250 C时制备的非晶态ZnO薄膜在波长389 nm处具有极强的紫外光发射，在波长431 nm处发出很强的紫光，在波长519 nm处发出较强的黄绿光。

Using pure ZnO and TiO₂ grains,ZnO/TiO₂ thin films were fabricated on Si substrates by electron beam evaporation method in O₂ environment. The structure and photoluminescence of ZnO/TiO₂ thin films grown under different temperatures were investigated. The structural properties were investigated by X-ray diffraction and Raman spectra. The data indicate that the ZnO film deposited on TiO₂buffer layer are amorphous. Their optical properties were investigated by photoluminescence spectra. The photoluminescence measurements show that the amorphous ZnO/TiO₂thin film prepared at 250 C emits strong UV at 389 nm,strong violet light at 431 nm and strong green-yellow light at 519 nm.