光学学报, 1993, 13 (10): 940, 网络出版: 2007-12-07
一种紫外或深紫外光刻的1:1折反射式光学系统
1:1 optics for UV or DUV lithography
摘要
设计了一种新的紫外或深紫外光刻物镜.该物镜与国内外现有的紫外或深紫外光刻物镜相比,既能满足大数值孔径的需要,又能充分利用物镜的视场.采用环形照明,能缓解因增大数值孔径而使焦深缩短的矛盾.
Abstract
The design of a new kind of UV or DUV lithography lenses is described in this paper. Compared with other UV or DUV lithography lenses, this lens can meet the needs of higher numerical aperture and full use of its field. Using the ring illumination, this lens can provide a solution for the contradiction of shortening DOF while enlarging NA.
鄢雨, 邹海兴, 王之江. 一种紫外或深紫外光刻的1:1折反射式光学系统[J]. 光学学报, 1993, 13(10): 940. 鄢雨, 邹海兴, 王之江. 1:1 optics for UV or DUV lithography[J]. Acta Optica Sinica, 1993, 13(10): 940.
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