针对X射线透射光栅摄谱仪中的高线密度光栅,研究了采用电子束曝光和X射线曝光技术结合制作高线密度X射线透射光栅的工艺技术。首先利用电子束曝光和微电镀技术在镂空的薄膜上制备母光栅X射线掩模版,然后利用X射线曝光和微电镀技术小批量复制光栅。在国内首次完成了3333 lp/mm X射线透射光栅的研制,栅线宽度为150 nm,周期为300 nm,金吸收体厚度为500 nm。衍射效率标定的结果表明,该光栅的占空比合理、侧壁陡直,具有良好的色散特性,能够满足空间探测、同步辐射和变等离子诊断等多个领域的应用。

The manufacture of high-line-density X-ray transmission gratings for X-ray spectroscopy by using electron beam lithography and X-ray lithography was reported. Firstly, a master mask was fabricated on polyimide membrane by electron beam lithography and micro-electroplation. Secondly, X-ray transmission gratings were efficiently replicated by X-ray lithography and micro-electroplating. With the combined technology, 3333 lp/mm X-ray transmission gratings with 300 nm period, 150 nm width of grating bar, and 500 nm thickness of gold absorber, were successfully fabricated in China for the first time. The calibration results of diffraction efficiency show that the fabricated gratings with rectangle cross-section profile and reasonable dispersion and line-and-space ratio, can meet the requirement of X-ray transmission spectroscopy in many fields such as astrophysics, synchrotron radiation facilities and plasma diagnostics, etc.