光学学报, 2009, 29 (2): 556, 网络出版: 2009-02-23   

溶胶-凝胶法制备ZrO2/SiO2双层减反硬膜

Preparation of ZrO2/SiO2 Antireflective Hard Coating from Sol-Gel Processing
作者单位
中国科学院上海光学精密机械研究所 高功率激光物理联合实验室, 上海 201800
摘要
以锆酸丙酯[Zr(OPr)4]、正硅酸乙酯(TEOS)为原料, 用溶胶-凝胶(sol-gel)提拉法涂膜, 制备高透过的λ/ 4~λ/ 4型ZrO2/SiO2双层减反膜。该减反膜的表面均匀, 均方根(RMS)粗糙度为1.038 nm, 平均粗糙度(RA)为0.812 nm。制备的双层减反膜具有很好的减反效果, 在石英玻璃基片二面涂膜, 在激光三倍频波长351 nm处透射比达到99.41%, 比未涂膜石英玻璃基片的透射比提高了6.14%;在基频波长1053 nm处透射比达到99.63%, 比未涂膜K9光学玻璃基片的透射比提高了7.67%。膜层具有较高的激光损伤阈值, 在激光波长为1053 nm, 脉冲宽度为1 ns时, 薄膜的激光损伤阈值达到16.8 J/cm2。膜层具有良好的耐擦除性能。
Abstract
A type of quarter-wavelength two-layer antireflective hard coating has been developed by sol-gel dipping method with zirconium n-propoxide [Zr(OPr)4] and tetraethoxysilane (TEOS) as precursors. The coating possesses smooth and even surface, its root-mean-square rouhness is 1.038 nm and the average roughness is 0.812 nm. For the silica glass substrate with two sides coated with the above coating, the transmittance at 351 nm, the third harmonic of 1053 nm, is 99.41%, which is improved by 6.14% than that of the uncoated material. For the double-side-coated K9 substrate, the transmittance at 1053 nm is about 99.63%, which is improved by 7.67%. The laser damage threshold of the coating is 16.8 J/cm2, for 1053 nm wavelength and 1 ns pulse width. The coating has well antireflective and scratch-resistant performance, as well as high damage threshold.

李海元, 唐永兴, 胡丽丽. 溶胶-凝胶法制备ZrO2/SiO2双层减反硬膜[J]. 光学学报, 2009, 29(2): 556. Li Haiyuan, Tang Yongxing, Hu Lili. Preparation of ZrO2/SiO2 Antireflective Hard Coating from Sol-Gel Processing[J]. Acta Optica Sinica, 2009, 29(2): 556.

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