光学学报, 2009, 29 (6): 1729, 网络出版: 2009-06-08
氧化钪/氧化硅反射薄膜的355 nm激光损伤特性
Laser-Induced Damage Performance of Sc2O3/SiO2 High-Reflection Coatings at 355 nm
摘要
采用电子束蒸发法制备了Sc2O3单层薄膜和Sc2O3/SiO2多层反射膜。利用原子力显微镜、 X射线衍射仪等方法对薄膜的表面和结构进行了研究。采用355 nm激光研究了Sc2O3/SiO2多层薄膜的损伤特性和预处理效应, 并对Sc2O3的损伤原因进行了分析。实验发现, Sc2O3具有较宽的带隙, 薄膜结构为立方相, 影响Sc2O3/SiO2多层反射膜抗损伤能力的主要因素是材料的纯度。
Abstract
Sc2O3 single layer and Sc2O3/SiO2 coatings were prepared by electron beam evaporation. The surface and the microstructure of the film were characterized by AFM and X-ray diffraction, respectively. The laser-induced damage threshold and laser conditioning effect at 355 nm were investigated. The results show that the Sc2O3 film has wide optical band-gap and cubic phase structure. The laser-induced damage resistance of Sc2O3/SiO2 coatings is limited by the impurity of the source materials.
马平, 陈松林, 潘峰, 王震, 罗晋, 吴倩, 邵建达. 氧化钪/氧化硅反射薄膜的355 nm激光损伤特性[J]. 光学学报, 2009, 29(6): 1729. Ma Ping, Chen Songlin, Pan Feng, Wang Zhen, Luo Jin, Wu Qian, Shao Jianda. Laser-Induced Damage Performance of Sc2O3/SiO2 High-Reflection Coatings at 355 nm[J]. Acta Optica Sinica, 2009, 29(6): 1729.
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