中国激光, 2009, 36 (s1): 257, 网络出版: 2009-06-18
背光照明连续相位板对光束波前畸变的宽容度分析
Wavefront Distortion Tolerance of Continuous Phase Plate for Backlighter
物理光学 焦斑整形 连续相位板 背光照明 波前畸变 physical optics focal spot shaping continuous phase plate backlighter wavefront distortion
摘要
由Zernike多项式生成P-V值在5λ(1053 nm)范围之内变化的离焦、像散、彗差和球差等波前畸变, 叠加入用改进Gerchberg-Saxton(G-S)算法设计的背光照明连续相位板(CPP)透射波前, 采用快速傅里叶变换方法计算远场。从能量利用率、焦斑10~100 μm尺度的均匀性和焦斑尺寸三方面分析了波前畸变类型和畸变量大小对三倍频(351 nm)整形焦斑的影响。结果表明, 焦斑的能量利用率和焦斑尺寸对波前畸变有比较大的宽容度, 当波前畸变和CPP本身透射波前P-V相当时, 两者的变化量均在5%之内; 整形焦斑的均匀性对波前畸变比较敏感, 1λ的畸变量使焦斑的均方根(RMS)值从0.325增加到了0.45, 增量达到38.5%, 必须对全系统的波前畸变进行严格控制。
Abstract
The wavefront, such as power, astigmatism, coma and spherical aberration distortion etc., was currently generated by Zernike polynomial with the P-V value less than 5λ (1053 nm). Then with the generated wavefront added the continuous phase plate (CPP), which was designed for backlight with the methods of improved Gerchberg-Saxton (G-S) algorithm, the focus process was simulated by fast Fourier transform (FFT) algorithm. The influences of wavefront distortion type and wavefront distortion value on the 3ω (351 nm) shaping focal spots were studied in details through three factors, energy efficiency, the uniformity of the 10~100 μm scale of focus and the size of the focal spot. The results showed it had a relatively wider tolerance for wavefront distortions due to the energy efficiency and the size of the focal spot, the variances will be no more than 5% as the P-V of the generated wavefront distortion was analogous with the CPP. The uniformity of the focal spot was very sensitive to wavefront distortion, with 1λ (1053 nm) wavefront distortion, the root-mean-square (RMS) of focal spots will be increased about 38.5%, from 0.325 to 0.45. Therefore, it indicates that it is necessary to control the wavefront distortions of the whole laser systems.
赵军普, 胡东霞, 粟敬钦, 李平, 周维, 代万俊. 背光照明连续相位板对光束波前畸变的宽容度分析[J]. 中国激光, 2009, 36(s1): 257. Zhao Junpu, Hu Dongxia, Su Jingqin, Li Ping, Zhou Wei, Dai Wanjun. Wavefront Distortion Tolerance of Continuous Phase Plate for Backlighter[J]. Chinese Journal of Lasers, 2009, 36(s1): 257.