根据军用光学仪器的使用要求,在多光谱ZnS基底上镀制增透膜,要求薄膜在可见与近红外波段400-1000 nm及远红外波段7-11 μm的平均透射率均大于90%。采用电子束真空镀膜的方法并加以离子辅助沉积系统,通过选择ZnS和YbF3作为高低折射率材料,利用最新OptiLayer软件三大模块的功能辅助,调整镀膜工艺参数,改进监控方法,减少膜厚控制误差,在多光谱ZnS基底上成功镀制符合使用要求的增透膜。所镀膜层在可见与近红外波段400-1000 nm的平均透射率大于91%,远红外波段7-11 μm的平均透射率大于90%,能够承受恶劣的环境测试,完全满足军用光学仪器的使用要求。

In order to meet the military instruments′ operating requirements,An antireflection coating on the substrate of ZnS at 400-1000 nm (visible and near infrared band) and 7-11 μm (far infrared band) is deposited,it requires a average transmittance over 90%. Electronic beaming vacuum depositing method is adopted with the aid of ion assistant deposition systems as well as chose ZnS as the material of high refractive index and YbF3 as the material of low refractive index. Using three modular processing systems of the latest optilayer software as assistance,optimizing technical parameters,and improving monitor method,reducing thickness error,antireflection coating on the substrate of ZnS to achieve the requirements have be deposited. The average transmittance exceeds 91% through 400-1000 nm wavelength. Moreover,it makes the transmittance over 90% through 7-11 μm wavelength. In addition,the film can resist harsh environment and completely meet the demands of military optical instruments.