激光与光电子学进展, 2009, 46 (12): 46, 网络出版: 2009-12-17
ArF 准分子激光器线宽压缩技术 
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ArF Excimer laser Line Narrowing Technique
激光器 准分子激光器 线宽压缩技术 主振荡功率放大 laser excimer laser line narrowing technique master oscillator and power amplifier
摘要
ArF 准分子激光器是实现45 nm 技术节点光刻的主流光源。综述了准分子激光器的研究现状,介绍了主振荡功率放大(MOPA)与种子注入锁定系统(ILS)双腔结构以及主要波长分离元件,着重介绍了深紫外波长区193 nm 的光谱线宽压缩技术。
Abstract
ArF excimer laser is the main light source for 45 nm technology node lithography. The recent research of excimer laser is summarized,and the master oscillator and power amplifier (MOPA) and injection locking system (ILS) dual-chamber structure and wavelength separation optics are introduced. The line narrowing technique for 193 nm wavelength is reviewed.
张海波, 楼祺洪, 周军, 董景星, 魏运荣. ArF 准分子激光器线宽压缩技术[J]. 激光与光电子学进展, 2009, 46(12): 46. Zhang Haibo, Lou Qihong, Zhou Jun, Dong Jingxing, Wei Yunrong. ArF Excimer laser Line Narrowing Technique[J]. Laser & Optoelectronics Progress, 2009, 46(12): 46.
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