研究了原子层沉积制备氧化铝薄膜的光学性能。以三甲基铝(TMA)和水为前聚体,分别在基板温度为250 ℃和300 ℃的K9和石英玻璃衬底上沉积了Al₂O₃光学薄膜。采用分光光度计,X射线光电子能谱(XPS),X射线衍射(XRD),原子力显微镜(AFM),扫描电子显微镜(SEM)等分析手段对薄膜的微结构、表面形貌和光学特性进行了研究。结果表明,原子层沉积法制备的Al₂O₃薄膜在退火前后均呈现无定形结构,元素成分接近化学计量比,其表面粗糙度小于1.2 nm,聚集密度高于0.97,光学非均匀性优于1%。同时在中紫外到近红外均有很好的光学性能,适合作为中间折射率和低折射率材料在光学薄膜中得到应用。

The optical properties of Al₂O₃ films grown by atomic layer deposition were investigated. Trimethylaluminium (TMA) and water vapour (H2O) were used as the chemical precursors to deposit Al₂O₃ films on glass substrates at temperature of 250 ℃ and 300 ℃ respectively. Characterization of the films such as optical properties,surface morphological image and microstructure were performed by using spectrophotometer,X-ray diffraction (XRD),X-ray photoelectron spectroscopy (XPS),scanning electron microscope (SEM) and atomic force microscopy (AFM).The results show that both the as-deposited and annealed A12O3 films are amorphous. The surface roughness is as low as 1.2 nm while the packing densities are larger than 0.97. Al₂O₃ films by this technique exhibit good optical properties with low absorption in the spectral region from mid-ultraviolet to near-infrared. This study indicates that Al₂O₃ film deposited by ALD is applicable for optical coatings of the materials with midde and low refractive index.