Chinese Optics Letters, 2010, 8 (3): 326, Published Online: Mar. 11, 2010
Subwavelength-resolution direct writing using submicron-diameter fibers Download: 623次
光学制造 亚微米线条 直接写入 微纳光纤笔 220.4241 Nanostructure fabrication 110.4235 Nanolithography 140.3510 Lasers, fiber 310.6628 Subwavelength structures,nanostructures
Abstract
A novel direct writing technique using submicron-diameter fibers is presented. This technique adopts contact mode in the process of writing, and submicron lines with different widths have been obtained. Experimental results demonstrate that the resolution of this technique can be smaller than the exposure wavelength of 442 nm, and 380-nm-wide line is achieved. In addition, the distribution of light fields in the photoresist layer is analyzed by finite-difference time-domain method.
Feng Tian, Guoguang Yang, Jian Bai, Qiaofen Zhou, Changlun Hou, Jianfeng Xu, Yiyong Liang. Subwavelength-resolution direct writing using submicron-diameter fibers[J]. Chinese Optics Letters, 2010, 8(3): 326.