光子学报, 2009, 38 (5): 1207, 网络出版: 2010-05-10
离子束溅射沉积Ir膜真空紫外反射特性研究
Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering
摘要
根据吸收材料基底上单层金属膜数学计算模型，对不同基片上各种厚度的Ir膜真空紫外反射率进行了优化计算.采用离子束溅射沉积技术，在石英、K9玻璃和Si基片上沉积了不同厚度的Ir膜，研究了基片、表面厚度、离子束能量及镀后热处理对Ir膜反射率的影响，在波长120 nm处获得了近30％正入射反射率.
Abstract
Based on the theoretical model of single metal layer on absorbing substrate,the thickness optimum calculation was performed for Ir layer on Bk7,quartz glass and Si substrate in the vacuum ultravialet (VUV) wavelength region.Single layer Ir films of different thicknesses were fabricated on those substrates by ion beam sputtering technique (IBS).The influence of substrate,layer thickness,ion beam energy and post-annealing on the reflectance were investigated,and nearly 30％ normal incident reflectance at 120 nm incident wavelength was obtained.
干蜀毅, 刘正坤, 盛斌, 徐向东, 洪义麟, 刘颍, 周洪军, 霍同林, 付绍军. 离子束溅射沉积Ir膜真空紫外反射特性研究[J]. 光子学报, 2009, 38(5): 1207. GAN Shu-yi, LIU Zheng-kun, SHENG Bin, XU Xiang-dong, HONG Yi-lin, LIU Ying, ZHOU Hong-jun, HUO Tong-lin, FU Shao-jun. Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering[J]. ACTA PHOTONICA SINICA, 2009, 38(5): 1207.
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