Chinese Optics Letters, 2010, 8 (s1): 159, Published Online: May. 14, 2010
Constructing multilayers with absorbing materials Download: 587次
多层膜 极紫外 X射线反射镜 空间光学 光刻术 230.4170 Multilayers 260.7200 Ultraviolet, extreme 340.7470 X-ray mirrors 350.6090 Space optics 220.3740 Lithography
Abstract
The strong absorption of materials in the extreme ultraviolet (EUV) above ~50 nm has precluded the development of efficient coatings. The development of novel coatings with improved EUV performance is presented. An extensive research was performed on the search and characterization of materials with moderate absorption, such as various lanthanides. Based on this research, novel multilayers based on Yb, Al, and SiO have been developed with a narrowband performance in the 50–92 nm range. Furthermore, procedures for the design of multi-material multilayers with absorbing materials have been derived, which resulted in multilayers with enhanced reflectance.
Juan I. Larruquert, Manuela Vidal-Dasilva, Sergio Garc?a-Cortes, Monica Fernandez-Perea, Jose A. Mendez, Jose A. Aznarez. Constructing multilayers with absorbing materials[J]. Chinese Optics Letters, 2010, 8(s1): 159.