Chinese Optics Letters, 2010, 8 (s1): 174, Published Online: May. 14, 2010
Multilayer Laue lens for focusing X-ray into nanometer size Download: 587次
多层膜劳厄透镜 X射线聚焦 磁控溅射 切片 抛光 340.0340 X-ray optics 310.1860 Deposition and fabrication 340.7440 X-ray imaging
Abstract
A multilayer Laue lens with a 15-nm outermost zone width is designed for an incident X-ray beam with an energy of 8 keV. WSi2/Si multilayer Laue lens with 324 layers and a total thickness of 7.9 \mu m is successfully fabricated using direct current magnetron sputtering method. After deposition, the multilayer is sliced and polished to achieve the ideal aspect ratio. Characterization results show that the multilayer structure is kept intact and the surface roughness is approximately 0.9 nm after slicing and repeated polishing.
Jingtao Zhu, Qiushi Huang, Haochuan Li, Jing Xu, Xiaoqiang Wang, Zhong Zhang, Zhanshan Wang, Lingyan Chen. Multilayer Laue lens for focusing X-ray into nanometer size[J]. Chinese Optics Letters, 2010, 8(s1): 174.