光子学报, 2010, 39 (4): 600, 网络出版: 2010-05-24
基于数字微镜器件亚微米制备技术研究
Submicron-sized Optical Fabrication with DMD Based Lithography
干涉光刻 傅里叶光学 微纳光子器件 阿贝成像原理 数字微镜器件 Interference lithography Fourier optics Micro-nanophotonic device Principle of Abbe′s imaging Digital Micromirror Device(DMD)
摘要
为了实时、便捷的改变光刻图案以用于微纳光子器件制备，使用数字微镜器件构建了一套无掩模亚微米尺度制备系统.基于阿贝成像原理分析了周期结构在相干光照明下的成像过程，并用数值模拟以及空间滤波实验证明了这个过程.使用此实验系统制作出了周期为900 nm的二维结构以及周期为数十微米的带缺陷结构.实验表明，使用数字微镜器件可以方便的制作出亚微米尺度的图案.
Abstract
Digital Micromirror Device (DMD) is employed as spatial light modulator to construct a digital maskless lithography system,which can be used to fabricate micro-nano photonic device conveniently.The imaging process of the periodic structure in the coherence light is analyzed.According to the numerical simulation and experimental result,the imaging process should be explained by the principle of Abbe′s imaging.With this system,2D periodic structure with the period of 900 nm is fabricated but defect is introduced.So DMD is a practical tool to fabricate submicron-sized pattern.
陆锦洪, 谢向生, 张培晴, 周建英. 基于数字微镜器件亚微米制备技术研究[J]. 光子学报, 2010, 39(4): 600. LU Jin-hong, XIE Xiang-sheng, ZHANG Pei-qing, ZHOU Jian-ying. Submicron-sized Optical Fabrication with DMD Based Lithography[J]. ACTA PHOTONICA SINICA, 2010, 39(4): 600.
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