光子学报, 2006, 35 (2): 0224, 网络出版: 2010-06-03
工作气压对电子束沉积ZrO2薄膜折射率和聚集密度的影响
Influence of Deposited Pressure on Refractive Index and Packing Density of ZrO2 Coatings by Electron Beam Evaporation
薄膜 ZrO2薄膜 折射率 聚集密度 电子束蒸发 Thin film ZrO2 coatings Refractive index Packing density Electron beam evaporation
摘要
采用电子束蒸发的方法,用石英晶体振荡法监控薄膜的蒸发速率,在不同工作气压下制备了ZrO2薄膜样品.在相调制型椭圆偏振光谱仪和分光光度计上对样品的光谱特性进行了测试.根据波长漂移的理论,计算出薄膜的聚集密度.结果表明,随着工作气压的降低,薄膜的聚集密度和折射率都随之增大.
Abstract
ZrO2 coatings were prepared by electron beam evaporation at different deposition pressure,while deposition rate was monitored and demonstrated by quartz crystal oscillation. Used the new spectroscopic ellipsometer and spectrophotometer to test about the ZrO2 deposited spectral character and measure the film refractive index. Calculated the packing density of thin-film according to wavelength deviation dispersion theory before and after the thin-film suck tide. It was found that the refractive index and packing density were increasing as the working pressure was decreasing.
郝殿中, 吴福全, 马丽丽, 闫斌, 张旭. 工作气压对电子束沉积ZrO2薄膜折射率和聚集密度的影响[J]. 光子学报, 2006, 35(2): 0224. Hao Dianzhong, Wu Fuquan, Ma Lili, Yan Bin, Zhang Xu. Influence of Deposited Pressure on Refractive Index and Packing Density of ZrO2 Coatings by Electron Beam Evaporation[J]. ACTA PHOTONICA SINICA, 2006, 35(2): 0224.