采用小光斑激光预处理扫描SiO2单层膜，利用激光损伤阈值的光斑效应对预处理前后SiO2单层膜中缺陷的影响进行分析，并引入缺陷阈值和缺陷密度来表征薄膜中引起损伤的缺陷。研究表明，激光预处理可以使SiO2单层膜在采用最大光斑条件下的损伤阈值提高1.6倍左右，并且激光预处理可清除薄膜中低阈值的缺陷。

The influence of laser-conditioning on defects of SiO2 mono-layer films, which is laser conditioned by small spot laser scanning process, is investigated by the spot-size effect of laser-induced damage. The threshold and the density of defect were introduced to characterize the initiating defects in the film. It is found that the laser-induced damage threshold can be increased by a factor of 1.6 under the largest spot-size used and the defects with low threshold can be removed by laser conditioning scanning process.