中国激光, 2010, 37 (10): 2615, 网络出版: 2010-09-25
电子束自动扫描SiO2材料沉积速率控制实验研究
Experimentation of Deposition Rate Control of SiO2 by E-Beam Auto-Sweeping
摘要
沉积速率是电子束蒸发制备光学薄膜的重要工艺参数之一,影响着成膜的微观结构和化学成分,从而对薄膜的光学性质和机械性质都产生很大的影响。SiO2材料是制备光学薄膜的主要低折射率材料之一,由于其导热性很弱,并且以升华的方式进行蒸发,因此在蒸发过程中表面会出现凹坑,影响其蒸发特性,不利于沉积速率的稳定。考虑到SiO2材料的蒸发特性,进行了电子束自动蒸发SiO2材料沉积速率控制实验,利用设计的扫描控制仪,采用设计的路径进行焦斑自动扫描,在扫描过程中采用比例-积分-微分(PID)闭环反馈法对沉积速率进行控制,实验结果表明,通过控制可以得到良好的材料表面特性和较稳定的沉积速率。
Abstract
Deposition rate is one of the important technical parameters of producing optical thin film by e-beam. Deposition rate affects the microstructure and chemical composition of film, which affects the optical and mechanical properties of film greatly. SiO2 material is one of the important low refractive index materials for producing optical film. Because SiO2 has a low thermal conductivity and sublimes when evaporated, some pits may emerge on the surface of material during evaporation. The pits may affect the evaporation characteristics of SiO2, which is disadvantaged to the stability of deposition rate. Considering the special evaporation characteristics of SiO2, the experiment of deposition rate control of SiO2 by e-beam auto-sweeping is performed. The experiment uses the designed sweeping controller to control the evaporation spot moves on the surface of material through a designed sweeping path automatically. During sweeping, the deposition control is performed by the PID closed-loop control. The result of experiment shows that good surface characteristics of material and stable deposition rate.
王宁, 魏朝阳, 邵建达, 范正修, 易葵. 电子束自动扫描SiO2材料沉积速率控制实验研究[J]. 中国激光, 2010, 37(10): 2615. Wang Ning, Wei Chaoyang, Shao Jianda, Fan Zhengxiu, Yi Kui. Experimentation of Deposition Rate Control of SiO2 by E-Beam Auto-Sweeping[J]. Chinese Journal of Lasers, 2010, 37(10): 2615.