Chinese Optics Letters, 2010, 8 (12): 1131, Published Online: Dec. 21, 2010  

Efficiency measurement of optical components in 45–110 nm range at beamline U27, HLS Download: 597次

Author Affiliations
National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China
Abstract
We propose a general correction method for the efficiency measurement of optical components in the 45–110 nm range to eliminate the contamination of higher-order harmonics at beamline U27 of the Hefei Light Source (HLS). The influence of harmonics can be deducted effectively from the initial measurement results through the analysis of the proportion of harmonics with a transmission grating and the efficiency measurement of optical elements at the harmonics wavelengths. The reflectivity measurement of a gold film is performed at the beamline to verify its validity. Results indicate that the corrected reflectivity is in good agreement with the theoretical value. The maximal deviation amounts to 1.93% at a wavelength of 85 nm and an incident angle of 5?.

Shengnan He, Ying Liu, Keqiang Qiu, Hongjun Zhou, Tonglin Huo, Shaojun Fu. Efficiency measurement of optical components in 45–110 nm range at beamline U27, HLS[J]. Chinese Optics Letters, 2010, 8(12): 1131.

关于本站 Cookie 的使用提示

中国光学期刊网使用基于 cookie 的技术来更好地为您提供各项服务,点击此处了解我们的隐私策略。 如您需继续使用本网站,请您授权我们使用本地 cookie 来保存部分信息。
全站搜索
您最值得信赖的光电行业旗舰网络服务平台!