中国激光, 2015, 42 (3): 0303012, 网络出版: 2015-02-03
光波导端面的准分子激光刻蚀技术研究 下载: 561次
Research on Excimer Laser Etching Technology for Achieving Optical Waveguide End Face
激光技术 准分子激光 光波导 激光消融 光互连 光印刷背板 laser technique excimer laser optical waveguide laser ablation optical interconnect optical printed circuit backplane
摘要
面向光印刷互连背板的应用需求,提出基于准分子激光消融原理对光波导的刻蚀技术进行研究,在背板上任意位置获得光波导端面实现光耦合。采用193 nm 波长的准分子激光作为光源,通过方形掩模孔径投影在互连背板光波导上,研究了激光能量、激光脉冲次数与刻蚀深度、端面粗糙度等参量之间关系,通过刻蚀参数的优化,刻蚀后端面光耦合损耗增加量约1.3 dB。
Abstract
Based on the excimer laser ablation principle, etching technique for achieving optical waveguide end face is proposed for application requirements of optical printed circuit backplane interconnect. With the laser etching technique, optical coupling end face can be fabricated at any position on optical printed circuit backplane. An excimer laser with the wavelength of 193 nm is used as the ablation light source. The laser beam is projected onto the optical waveguide for etching through a square aperture mask. The relationship among the laser energy, laser pulse times and etching depth, surface roughness has been studied experimentally. After optimizing the etching parameters, the coupling loss increase of the waveguide end face is approximate 1.3 dB after the etching process.
贾娜娜, 邓传鲁, 庞拂飞, 顾鑫, 王廷云. 光波导端面的准分子激光刻蚀技术研究[J]. 中国激光, 2015, 42(3): 0303012. Jia Nana, Deng Chuanlu, Pang Fufei, Gu Xin, Wang Tingyun. Research on Excimer Laser Etching Technology for Achieving Optical Waveguide End Face[J]. Chinese Journal of Lasers, 2015, 42(3): 0303012.