红外技术, 2010, 32 (4): 226, 网络出版: 2011-01-05
高纯碲和镉中痕量杂质元素的辉光放电质谱分析
The Analysis of High Purity Tellurium and Cadmium Using Glow Discharge Mass Spectrometry and Ablation Inductively Coupled Plasma Mass Spectrometry
辉光放电质谱（GD-MS） 激光烧蚀电感耦合等离子体质谱（LA-ICP-MS） 痕量杂质测定 高纯碲和镉 glow discharge mass spectrometry (GD-MS) laser ablation inductive coupled plasma mass spect determination of trace impurity high purity Te and Cd
摘要
采用辉光放电质谱（GD-MS）对碲、镉原材料中锂、硼、钠、铝、硅、铁、铜、锌、镓、砷、银、金、铅、铀等62 个杂质元素进行了测试，并与激光烧蚀电感耦合等离子体质谱（LA-ICP-MS）所测的结果进行比较，对结果差异的潜在因素、个别元素含量异常偏大的原因进行了系统分析，着重论述VG9000 辉光放电质谱仪的特点及痕量杂质分析优势。
Abstract
One purity tellurium and one purity cadmium were analyzed by glow discharge mass spectrometry (GD-MS). Each sample was prepared accordingly and subsequently analyzed for a wide range of 62 elements. The results have been compared with those were analyzed by laser ablation inductive coupled plasma mass spectrometry (LA-ICP-MS). Characteristics and advantages of analyzing trace impurity of VG9000 instrument are discussed.
荣百炼, 胡赞东, 丛树仁, 韩福忠, 姬荣斌. 高纯碲和镉中痕量杂质元素的辉光放电质谱分析[J]. 红外技术, 2010, 32(4): 226. RONG Bai-lian, HU Zan-dong, CONG Shu-ren, HAN Fu-zhong, JI Rong-bin. The Analysis of High Purity Tellurium and Cadmium Using Glow Discharge Mass Spectrometry and Ablation Inductively Coupled Plasma Mass Spectrometry[J]. Infrared Technology, 2010, 32(4): 226.
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