光谱学与光谱分析, 2010, 30 (6): 1657, 网络出版: 2011-01-26
发射光谱法研究纳秒激光烧蚀硅等离子体特性
Characteristic Study of Plasma Plume Produced by Nanosecond Pulsed Laser Ablation of Silicon Using Optical Emission Spectroscopy
脉冲激光烧蚀 等离子体发射光谱 电子温度 电子密度 Pulsed laser ablation Plasma emission spectroscopy Electron temperature Electron density
摘要
利用调Q Nd3+∶YAG激光器三倍频355 nm激光脉冲烧蚀空气环境的硅样品, 观测不同脉冲激光能量下产生的等离子体在380~420 nm范围内的时间-空间分辨等离子体发射光谱, 观测到在等离子体羽膨胀初期存在N+发射光谱。 在局域热力学平衡近似条件下, 根据时间-空间分辨等离子体发射光谱计算得到等离子羽体电子温度和电子密度随时间延时存在二次指数衰减变化, 等离子体羽体电子温度和电子密度的空间分布近似呈Lorentz分布, 发现在确定激光脉冲能量下电子密度空间分布最大值偏离光谱强度最大空间位置并对产生原因进行分析, 探讨了等离子体羽参数与激光脉冲能量的关系。
Abstract
The 355 nm laser pulse from THG (Third Harmonic Generation) of a Q-switched Nd3+∶YAG laser was used to ablate silicon mounted in air. The time-and space-resolved optical emission spectra were measured for different pulse energy in the wavelength range of 380-420 nm, the emission spectra of N+ was found for impact ionization of air near target surface on the early stage of plasma plume expansion. Under the model of local thermodynamic equilibrium, the electronic temperature of plasma was deduced to be in the range of 18 000-40 000 K using the Saha equation by the relative line intensities, and the electron density was deduced to be in the 1017 cm-3 scale by FWHM (the full width at half maximum) of Si spectral lines, the temporal and spatial evolution of the electronic temperature and electron density was given, showing that the electronic temperature and electron density exhibited second order exponential decreasing with laser delay time and a Lorentz distribution in space. The reason for the spatial position deviation of the maximum electron density from the maximum spectral intensity was analyzed. The relationship between the plasma plume parameters and laser pulse energy was discussed.
高勋, 金明星, 丁大军, 林景全. 发射光谱法研究纳秒激光烧蚀硅等离子体特性[J]. 光谱学与光谱分析, 2010, 30(6): 1657. GAO Xun, JIN Ming-xing, DING Da-jun, LIN Jing-quan. Characteristic Study of Plasma Plume Produced by Nanosecond Pulsed Laser Ablation of Silicon Using Optical Emission Spectroscopy[J]. Spectroscopy and Spectral Analysis, 2010, 30(6): 1657.