利用聚合物SU-8光刻胶在激光作用下折射率会发生变化的特点，将其作为最后的光学材料，采用光刻胶热熔法和图形转移法，设计并制作了填充因子接近0.75、自写入光波导、六角排列的微透镜阵列。对阵列的表面形态、三维结构和光学性能分别进行了观察、测试与分析，发现用SU-8胶制作的微透镜阵列外观良好，边缘清晰；自写入光波导微透镜阵列的三维结构良好；波导末梢的光点分布均匀，光强一致性高。这种自写入光波导的微透镜阵列降低了透镜阵列与探测阵列精确装配的难度，而且其制作工艺流程简单、成本低廉、适合批量复制，这种阵列元件还有质量轻、体积小的特点，有很广的应用前景。

Polymer microlens array with self-written waveguides is fabricated with SU-8 material which is a kind of epoxy based photoresist. Melting photoresist and image transferring are employed to fabricate the microlens array. Because of the melting and attendant expanding process of the photoresist, the actual fill factor of the array exceeds the design one, which is 0.749. SU-8 photoresist and glass substrate are separated by a layer of polydimethylsiloxane (PDMS) due to the strong bonding force between them. With the good separation effect of PDMS film, UV-cured SU-8 microlens array is obtained without mechanical damage. Profile, performance of the light spots at the end of the self-written waveguides and their uniformity are observed and tested. It is concluded that the SU-8 microlens array with self-written waveguides is fine, it images the filament of the metallographic microscope well and its light spots at the end of the waveguide are of high uniformity. By using this polymer microlens array, the assembling between the microlens array and detector array is expected to be achieved easily. This polymer microlens array has great potential applications in many optoelectronic devices.