采用电子束刻蚀技术在聚甲基丙烯酸甲酯（PMMA）基底上制作高精度、大面积纳米量级的二维Thue-Morse型准周期光子晶体，并且对其远场衍射的光学特性进行了实验研究。同时，根据光的衍射和干涉理论，对二维Thue-Morse型准周期光子晶体的夫琅禾费衍射图像的空间强度分布进行了理论分析，理论模拟和实验结果一致。

A large-area two-dimensional Thue-Morse quasicrystal with nanometer structures is fabricated on poly-methyl methacrylate (PMMA) substrate using the technology of electron beam lithography (EBL). And the optical properties of sample are studied by the far-field diffraction experiment. In addition, according to the diffraction principle and interference theory, the Fraunhofer diffraction patterns of the Thue-Morse quasicrystal are simulated and analyzed. It is shown that the theoretical simulations are consistent with the experimental results very well.