设计了Nd：YAG激光用三倍频分离膜，膜层材料为SiO2和HfO2。经过优化，膜系在355 nm处的反射率在99%以上，在532 nm和1 064 nm处透射率也在99%以上。采用电子束蒸发技术，在熔融石英基底上制备了样品,经测量，制备的分离膜光学性能与设计值接近。分离膜在355 nm激光辐照下的损伤阈值为5.1 J/cm2，并用微分干涉显微镜表征了薄膜损伤形貌。

Using electron beam evaporation, a 355 nm separator was designed by depositiing SiO2 and HfO2 alternatively. The coating has a reflectivity of larger than 99% at 355 nm through optimization and a transmittance larger than 99% at 532 nm and 1 064 nm. It has good electric-field distribution. The spectra of the fabricated coating is close to the designed one. The laser-induced damage threshold of the coating is 5.1 J/cm2. Morphology of laser-induced damage of the coating was characterized by differential interference contrast microscope．