半导体光子学与技术, 2008, 14 (2): 136, 网络出版: 2011-08-19  

Characteristic Analysis of Diffraction from Restricted Output End Surface of Multiple Quantum Wells Planar Waveguide

Characteristic Analysis of Diffraction from Restricted Output End Surface of Multiple Quantum Wells Planar Waveguide
作者单位
Fujian Provincial Key Laboratory of Photonic Technology, Institute of Laser &Optoelectronics Technology, Fujian Normal University, Fuzhou 350007, CHN
摘要
Abstract
Based on Rayleigh-Sommerfeld scalar diffraction formula, analyzed is the diffraction field distribution of the restricted output end surface of multiple quantum wells planar waveguide by slit. Obtained is its analytical expression of field distribution, which permits accurate and effective study on the characteristic of diffraction field from the restricted output end surface of the waveguide by slit. Then, the variation curve of the beam propagation factorM2versus the slit width is computed by the second moment method. It is useful for understanding the restricted diffraction properties of the multiple quantum wells planar waveguide. When the slit half width is bigger than the core layer s half width, the beam propagation factorM2value tends to a constant 1·108. Therefore, the corresponding field amplitude distribution is approximated by Gaussian function, and the far field divergence half angle(θ0,G=0.091 8) is calculated by matching efficiency method.

HU Lin-shun, GUO Fu-yuan, LI Lian-huang, GAO Rui, PENG Yu-jia. Characteristic Analysis of Diffraction from Restricted Output End Surface of Multiple Quantum Wells Planar Waveguide[J]. 半导体光子学与技术, 2008, 14(2): 136. HU Lin-shun, GUO Fu-yuan, LI Lian-huang, GAO Rui, PENG Yu-jia. Characteristic Analysis of Diffraction from Restricted Output End Surface of Multiple Quantum Wells Planar Waveguide[J]. Semiconductor Photonics and Technology, 2008, 14(2): 136.

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