纳米光学表面是指表面粗糙度均方根值在纳米尺度的光学表面，广泛应用于微电子领域以及光学仪器和装备领域。纳米光学表面加工缺陷主要有表面损伤和亚表层损伤两个方面；基于非接触式无损检测手段的优点，针对白光干涉技术和表面散射测量技术等进行原理分析，采用不同的工艺条件制备不同加工缺陷的测试样片，分别采用白光干涉仪、原子力显微镜和表面散射测量仪进行测量对比分析，实验结果表明白光干涉技术是进行表面粗糙度和亚表层损伤测量的有效手段，具有检测精度高、测量速度快以及对被测件无损伤等特点。

Optical nanosurface whose RMS of roughness is at the nanoscale, is widely used in microelectronics and optical instruments. Optical nanosurface processing defects mainly contain surface damage and subsurface damage. Because of the advantage of non-destructive testing, we analyze the measurement technique of surface scattering theory and white light interferometry. Then the test samples with different processing defects are prepared from different technological conditions, and are measured by three different techniques, such as white light interferometer, atomic force microscopy and surface scattering measuring instrument. Comparison of experimental results show that white light interferometry is an effective measurement means for the measurement of surface roughness and subsurface damage with high precision, high speed and no other damage during the testing.