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高分辨率投影光刻机光瞳整形技术

Pupil Shaping Techniques in High Resolution Projection Exposure Tools

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摘要

在高分辨光学光刻技术中,光瞳整形技术针对不同的掩模图形产生特定的光瞳光强分布模式,从而实现分辨力增强,获得更好的成像性能。概述了高分辨率投影光刻机照明系统中基于衍射光学元件(DOE)、微透镜阵列(MLA)和微反射镜阵列(MMA)的3种光瞳整形技术,并对这些技术的工作原理、设计制作方法和性能特点进行了归纳与总结。

Abstract

In the high resolution optical lithography technology, illumination pupil shaping is employed to enhance the lithography resolution and achieve high imaging performance by using various illumination modes according to different mask structures. In this paper, three approaches of pupil shaping techniques based on diffractive optical element (DOE), micro lens array (MLA) and micro mirror array (MMA) are summarized. The principles, design and manufacturing methods are concluded.

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中图分类号:O43;TN305.7

DOI:10.3788/lop48.111101

所属栏目:综述

责任编辑:韩峰

基金项目:国家科技重大专项项目(2009ZX02205-001)资助课题。

收稿日期:2011-04-29

修改稿日期:2011-06-02

网络出版日期:2011-09-30

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胡中华:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院研究生院, 北京 100049
杨宝喜:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
朱菁:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
肖艳芬:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800中国科学院研究生院, 北京 100049
曾爱军:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
黄立华:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
赵永凯:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800
黄惠杰:中国科学院上海光学精密机械研究所信息光学与光电技术实验室, 上海 201800

联系人作者:胡中华(huzhonghua@siom.ac.cn)

备注:胡中华(1984—),男,博士研究生,主要从事高数值孔径光学光刻技术方面的研究。

【1】Harry J.. Levinson, Principles of lithography[M]. Bellingham & Washionton: SPIE Press, 2001

【2】Zhang Wei, Gong Yan. Design of diffractive optical elements for off-axis illumination in projection lithography[J]. Optics and Precision Engineering, 2008, 16(11): 2081~2086
张巍, 巩岩. 投影光刻离轴照明用衍射光学元件设计[J]. 光学 精密工程, 2008, 16(11): 2081~2086

【3】Guo Liping, Huang Huijie, Wang Xiangzhao. Off-axis illumination for optical lithography[J]. Laser Journal, 2005, 26(1): 23~25
郭立萍, 黄惠杰, 王向朝. 光学光刻中的离轴照明技术[J]. 激光杂志, 2005, 26(1): 23~25

【4】H. Ganser, M. Darscht, Y. Miklyaev et al.. High-throughput homogenizers for hyper-NA illumination systems[C]. SPIE, 2006, 6154: 61542

【5】Melchior Mulder, A. Engelen, O. Noordman et al.. Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems[C]. SPIE, 2009, 7520: 75200

【6】E. M. Sczyrba, S. Angonin. The importance of being homogeneous: on the influence of illumination inhomogeneity on AIMS images[C]. SPIE, 2005, 5992: 859~872

【7】Melchior Mulder, A. Engelen, O. Noordman et al.. Performance of FlexRay, a fully programmable illumination system for generation of freeform sources on high NA immersion systems[C]. SPIE, 2010, 7640: 76401

【8】Francois Weisbuch, Scott Warrick, Will Conley et al.. Assessment of 5-pole illumination for 65nm-node contact holes[C]. SPIE, 2005, 5754: 1405~1416

【9】A. C. Durr, K. Bubkim Chen. Experimental evaluation of bulls-eye illumination for assist-free, random contact printing at sub-65nm node[C]. SPIE, 2006, 6154: 615401

【10】V. A. Soifer, V. V. Kotlyar, L. L. Doskolovich. Iterative Methods for Diffractive Optical Elements Computation[M]. London: Taylor & Francis, 1997

【11】F. Wyrowski, O. Bryndahl. Iterative Fourier-transform algorithm applied to computer holography[J]. J. Opt. Soc. Am. A, 1986, 5(7): 1058~1065

【12】Wu Rong, Zhao Dongfeng, Dai Yaping. Optimize design of diffractive optics elements by parallel simulated annealing[J]. Acta Optica Sinica, 2010, 30(9): 2544~2548
邬融, 赵东峰, 戴亚平. 并行模拟退火算法优化衍射光学元件设计[J]. 光学学报, 2010, 30(9): 2544~2548

【13】J. S. Liu, M. R. Taghizadeh. Iterative algorithm for the design of diffractive phase elements for laser beam shaping[J]. Opt. Lett., 2002, 27(16): 1463~1465

【14】Oliver Ripoll, Ville Kettunen, Hans Peter Herzig. Review of iterative Fourier-transform algorithms for beam shaping applications[J]. Opt. Engng., 2004, 43(11): 2549~2556

【15】V. Arrizon, M. Testorf, S. Sinzinger et al.. Iterative optimization of phase-only diffractive optical elements based on a lenslet array[J]. J. Opt. Soc. Am. A, 2000, 17(12): 2157~2164

【16】R. W. Gerchberg, W. O. Saxton. A practical algorithm for the determination of phase from image and diffraction plane pictures[J]. Optik, 1972, 35: 237~246

【17】P. M. Hirsch, J. A. Jordan, L. B. J. Lesem. Method of making an object independent diffuser America, 3619022[P]. 1971-11-09

【18】J. R. Fineup. Iterative method applied to image reconstruction and to computer generated holograms[J]. Opt. Engng., 1980, 19: 297~306

【19】M. A. Seldowitz, J. P. Allebach, D. W. Sweeney. Synthesis of digital holograms by direct binary search[J]. Appl. Opt., 1987, 26(14): 2788~2798

【20】S. Kirkpatrick, C. D. Gelatt, M. P. Vecchi. Optimization by simulated annealing[J]. Science, 1983, 220(4598): 671~680

【21】N. Yoshikawa, M. Itoh, T. Yatagai. Quantized phase optimization of two-dimensional Fourier kinoforms by a genetic algorithm[J]. Opt. Lett., 1995, 20(7): 752~754

【22】V. Kettunen, O. Ripoll, H. P. Herzig. Beam shaping in deep UV: comparison of methods[J]. Diffractive Optics, 2001, 30: 80~81

【23】C. Kopp, L. Ravel, P. Meyrueis. Efficient beam shaper homogenizer design combining diffractive optical elements, microlens array and random phase plate[J]. J. Opt. A: Pure Appl. Opt., 1999, 1: 398~403

【24】V. Kettunen, Heptagon, Zurich. Applications of Diffractive and Micro-Optics in lithography[M]. Waltham: Academic Press. Encyclopedia of Morden Optics (Diffractive systems), 2004. 281~290

【25】Jerry Leonard, James Carriere, Jared Stack et al.. An improved process for manufacturing diffractive optical elements for off-axis illumination systems[C]. SPIE, 2001, 6924: 69242O

【26】Marc D. Himel, Robert E. Hutchins, Jamey C. Colvin et al.. Design and fabrication of customized illumination patterns for low k1 lithography: a diffractive approach[C]. SPIE, 2001, 4346: 1436~1442

【27】Jin Guofan, Yan Yingbai, Wu Mingxian et al.. Binary Optics[M]. Beijing: National Defense Industry Press, 1998
金国藩, 严瑛白, 邬敏贤 等. 二元光学[M]. 北京: 国防工业出版社, 1998

【28】Yuri V. Miklyaev, Waleri Imgrunt, V. S. Pavelyev et al.. Novel continuously shaped diffractive optical elements enable high efficiency beam shaping[C]. SPIE, 2010, 7640: 764024

【29】Fred M. Dickey, Louis S. Weichman, Richard N. Shagam. Laser beam shaping techniques[C]. SPIE, 2000, 4065: 338~348

【30】Lin Yong, Hu Jiasheng. Laser beam shaping techniques[J]. Laser Journal, 2008, 29(6): 1~4
林勇, 胡家升. 激光光束的整形技术[J]. 激光杂志, 2008, 29(6): 1~4

【31】H. Ganser, L. Aschke, D. Hauschild et al.. Refractive optical elements[C]. Sematech 2nd International Symposium on Immersion Lithography, 2005

【32】H. Ganser, L. Aschke, M. Darscht et al.. How refractive microoptics enable lossless hyper-NA illumination systems for immersion lithography[C]. European Mask and Lithography Conference, Dresden, 2006

【33】T. Bizjak, T. Mitra, D. Hauschild et al.. Novel refractive optics enable multipole off-axis illumination[C]. SPIE, 2008, 6924: 69242J

【34】P. Nussbaum, R. Volkel, H. P. Herzig et al.. Design, fabrication and testing of microlens arrays for sensors and microsystems[J]. Pure and Applied Optics: Journal of the European Optical Society Part A, 1997, 6(6): 617~636

【35】A. Schilling. Diffractive and Refractive Optical Microstructures: Theory, Design and Applications[D]. Neuchatel: University of Neuchatel, 2000

【36】A. Schilling, R. Merz, C. Ossmann et al.. Surface profiles of reflow microlenses under the influence of surface tension and gravity[J]. Opt. Engng, 2000, 39(8): 2171~2176

【37】Oliver, Ripoll. Far-Field Beam Shaping Elements for Deep UV Lithography[D]. Neuchatel: University of Neuchatel, 2003. 54~55

【38】P. Nussbaum, H. P. Herzig. Low numerical aperture refractive microlenses in fused silica[J]. Opt. Engng., 2001, 40(7): 1412~1414

【39】Huang Dajie, Fan Wei, Lin Zunqi. Spatial laser beam shaping using digital micromirror device[J]. Chinese J. Lasers, 2011, 38(5): 0502008
黄大杰, 范薇, 林尊琪. 数字微镜器件用于光束空间整形[J]. 中国激光, 2011, 38(5): 0502008

【40】Jorg Zimmermann, Paul Grupner, Jens Timo Neumann et al.. Generation of arbitrary freeform source shapes using advanced illumination systems in high-NA immersion scanners[C]. SPIE, 2010, 7640: 764005

【41】Han Chao, Wei Sui, Quan Xilong et al.. Holographic display of digital micromirror device[J]. Chinese J. Lasers, 2010, 37(1): 190~194
韩超, 韦穗, 权希龙 等. 数字微镜器件的全息显示[J]. 中国激光, 2010, 37(1): 190~194

【42】Gregory John McAvoy, R. P. S. O′reilly, V. P. Lawlor et al.. Methods of Fabricating Micro Mirror Assembly[P]. 2010, US2010/0149623

【43】Fabian Zimmer, Frank Niklaus, M. Lapisab et al.. Fabrication of large-scale mono-crystalline silicon micro-mirror arrays using adhesive wafer transfer bonding[C]. SPIE, 2010, 7208: 720807

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