强激光与粒子束, 2011, 23 (9): 2419, 网络出版: 2011-10-27
磁控溅射制备横向梯度分布的Mo/Si周期多层膜
Fabrication of laterally graded periodic Mo/Si multilayer using magnetron sputtering technology
Mo/Si多层膜 磁控溅射 梯度多层膜 反射率 同步辐射 Mo/Si multilayer magnetron sputtering laterally graded multilayer reflectivity synchrotron radiation
摘要
采用磁控溅射方法在Si基板上镀制了横向梯度分布的Mo/Si周期多层膜。以X射线掠入射反射测量了横向梯度多层膜的膜系结构，在基板65 mm长度范围内，多层膜周期从8.21 nm线性减小到6.57 nm，周期梯度为0.03 nm/mm。国家同步辐射实验室反射率计的反射率测试结果表明：该横向梯度分布周期多层膜上不同位置，能反射在13.3~15.9 nm波段范围内不同波长的极紫外光，反射率为60%~65%。
Abstract
A laterally graded multilayer was deposited on silicon substrate by using magnetron sputtering. The dspacing gradient of 0.03 nm/mm was achieved across a 65 mm long range on the substrate’s surface, with dspacing varying linearly from 8.41 nm to 6.57 nm, which was measured by grazing incidence Xray reflection (GIXR). Extreme ultraviolet reflectivity was measured in National Synchrotron Radiation Laboratory(NSRL). The measured reflectivity is 60%~65% at the wavelength range of 13.3 to 15.9 nm.秀学科带头人项目（09XD1404000）；科技部国际交流与合作专项项目（2008DFA01920）
涂昱淳, 宋竹青, 黄秋实, 朱京涛, 徐敬, 王占山, 李乙洲, 刘佳琪, 张力. 磁控溅射制备横向梯度分布的Mo/Si周期多层膜[J]. 强激光与粒子束, 2011, 23(9): 2419. Tu Yuchun, Song Zhuqing, Huang Qiushi, Zhu Jingtao, Xu Jing, Wang Zhanshan, Li Yizhou, Liu Jiaqi, Zhang Li. Fabrication of laterally graded periodic Mo/Si multilayer using magnetron sputtering technology[J]. High Power Laser and Particle Beams, 2011, 23(9): 2419.
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