硅材料作为光电探测器的基础材料， 研究其在强激光辐照下的损伤问题在激光探测、 **领域很有意义。 对高强度纳秒激光作用下硅表面的损伤形貌特征进行了研究， 结果表明: 激光等离子体的热效应及冲击波效应， 使激光作用区域内的物质迅速向外飞溅， 形成点坑， 并在点坑周围形成辐射状冷却物; 散射光与入射激光干涉产生形成周期性分布的热应力使得硅材料表面张力发生变化， 冷却后会在坑底表面产生周期性结构; 从激光等离子体的光谱中可以发现N， O和Si的特征光谱， 在重复激光脉冲作用下会在硅表面上覆盖一层导致色变的SiOx和SiNx复合薄膜， 是激光等离子体的喷射产物。

Silicon is the basic material for electro-photonic detectors, so the studies of the laser induced damage of silicon are of great significance in laser detecting and military applications. The damage characters of silicon under high intensity nanosecond laser pulses were investigated in the present paper. The results show that laser plasma has thermal effect, shock effect and spectral radiation effect, etc. These comprehensive effects combined together determinate the damage characters. By thermal effects and shock effects of laser plasma, the material is being melt, vaporized, ionized and pushed out at the laser irradiated area. In this way, the pit can be formed and the cooled ejected effluents are radially distributed. The silicon was melt at the bottom of the pit and the temperature was modulated by the intensity of the incident laser, which interfered with scattering laser simultaneously. The periodic heat distribution generates the period stripes. N, O and Si characteristic spectrum in the laser plasma prove that the colored film is the mixture of SiOx∶SiNy which were sprayed out from laser plasma under repetitive laser pulses.