半导体光电, 2011, 32 (6): 789, 网络出版: 2012-01-04  

高速集总型双耗尽电吸收调制器的研制

Fabrication of Highspeed Dualdepletion Lumped Electroabsorption Modulator
作者单位
中国科学院半导体研究所 材料开放实验室,北京 100083
摘要
设计并研制了一种新的直脊波导集总型电吸收调制器——集总型双耗尽电吸收调制器(DEAM)。同时,作为实验对照组,还制备了一种普通有源区结构的电吸收调制器(NEAM)。两种器件的测试结果对比分析表明,DEAM的电容明显要小于NEAM。脊波导长度为250μm,宽度为2.5μm的DEAM在-3V偏压下电容为0.225pF,对应的调制带宽估算为28.3GHz;1550nm输入波长条件下,DEAM在偏压为-1V至-2V之间调制效率最大,达到10dB/V,而-3V、-6V下的调制深度分别为22dB和26dB,满足40Gbit/s光纤通信要求。
Abstract
A novel dualdepletion lumped electroabsorption modulator (DEAM) was designed and fabricated. Meanwhile, a normal Electroabsorption modulator (NEAM) with active structure was fabricated for comparative study. The measured results indicate that the capacitance of DEAM was obviously smaller than that of NEAM. The capacitance of DEAM with a 2.5μm waveguide was 0.225pf under -3V bias voltage and the 3dB bandwidth correspondingly achieved 28.3GHz. The modulation depth at -3V was 22dB and even 26dB at -6V for 1550nm signal input. In addition, the largest modulation efficiency attained 10dB/V with the bias of -1~-2V. It is proved that the DEAM can satisfy the application of 40Gbit/s communication system.

邱应平, 汪洋, 邵永波, 周代兵, 赵玲娟, 王圩. 高速集总型双耗尽电吸收调制器的研制[J]. 半导体光电, 2011, 32(6): 789. QIU Yingping, WANG Yang, SHAO Yongbo, ZHOU Daibing, ZHAO Lingjuan, WANG Wei. Fabrication of Highspeed Dualdepletion Lumped Electroabsorption Modulator[J]. Semiconductor Optoelectronics, 2011, 32(6): 789.

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