半导体光电, 2011, 32 (6): 789, 网络出版: 2012-01-04
高速集总型双耗尽电吸收调制器的研制
Fabrication of Highspeed Dualdepletion Lumped Electroabsorption Modulator
“双耗尽”有源区 电容 静态消光比 RC常数 电荷层 dualdepletion active region capacitance static DC extinction ratio (ER) RCtime constant charge layer
摘要
设计并研制了一种新的直脊波导集总型电吸收调制器——集总型双耗尽电吸收调制器(DEAM)。同时,作为实验对照组,还制备了一种普通有源区结构的电吸收调制器(NEAM)。两种器件的测试结果对比分析表明,DEAM的电容明显要小于NEAM。脊波导长度为250μm,宽度为2.5μm的DEAM在-3V偏压下电容为0.225pF,对应的调制带宽估算为28.3GHz;1550nm输入波长条件下,DEAM在偏压为-1V至-2V之间调制效率最大,达到10dB/V,而-3V、-6V下的调制深度分别为22dB和26dB,满足40Gbit/s光纤通信要求。
Abstract
A novel dualdepletion lumped electroabsorption modulator (DEAM) was designed and fabricated. Meanwhile, a normal Electroabsorption modulator (NEAM) with active structure was fabricated for comparative study. The measured results indicate that the capacitance of DEAM was obviously smaller than that of NEAM. The capacitance of DEAM with a 2.5μm waveguide was 0.225pf under -3V bias voltage and the 3dB bandwidth correspondingly achieved 28.3GHz. The modulation depth at -3V was 22dB and even 26dB at -6V for 1550nm signal input. In addition, the largest modulation efficiency attained 10dB/V with the bias of -1~-2V. It is proved that the DEAM can satisfy the application of 40Gbit/s communication system.
邱应平, 汪洋, 邵永波, 周代兵, 赵玲娟, 王圩. 高速集总型双耗尽电吸收调制器的研制[J]. 半导体光电, 2011, 32(6): 789. QIU Yingping, WANG Yang, SHAO Yongbo, ZHOU Daibing, ZHAO Lingjuan, WANG Wei. Fabrication of Highspeed Dualdepletion Lumped Electroabsorption Modulator[J]. Semiconductor Optoelectronics, 2011, 32(6): 789.