利用射频溅射方法，制得 AZO透明导电膜，并用离子束刻蚀制备绒面，得到绒面 AZO透明导电膜。比较刻蚀前后光电性能及表面形貌，发现透过率稍有下降，在可见光波段透过率在 80%以上；电阻率略有上升，但仍保持在 10-3.·cm数量级，最低为 2.91×10-3.·cm；刻蚀后薄膜表面形貌变化较大，大多数薄膜表面呈现 “坑状”结构，横向尺寸在 0.5～1.0 μm，开口角在 120°左右，表面粗糙度从 7.29 nm上升到 36.64 nm。薄膜具有较好的表面微结构，在作太阳能电池前电极方面有较好的应用前景。

Aluminum-doped Zinc Oxide (AZO) transparent conductive thin films were prepared by RF sputtering and surface-textured AZO transparent conductive thin films were obtained by using ion etching. Effects of ion etching on the optical, electrical and structural properties of the films were investigated. A slight decrease was found in transmittance, but the transmittance is still more than 80% in the visible spectrum. The resistivity increased slightly, but still at the 10-3.·cm level, the minimum resistivity is 2.91×10-3.·cm. The surface topography changed noticeably after ion etching. Most films show "pit-like" structure, lateral dimensions in the 0.5～1.0 μm, opening angle 120° or so, and Root Mean Square (RMS) roughness increased from 7.29 nm to 36.64 nm. The films have good surface micro-structure, and show a good prospect as solar cells front-electrode.