中国激光, 2012, 39 (4): 0416001, 网络出版: 2012-03-17
均匀辐照365 nm LED光源设计及其在光刻中的应用
Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography
摘要
优化设计了365 nm紫外LED点光源阵列、聚焦透镜组的排布，实现了高强度均匀辐照的LED面光源。利用优化后的365 nm LED面光源进行了接触式曝光光刻实验，所得刻写图形与掩模板图形一致。提出的基于365 nm紫外LED阵列均匀辐照面光源的光刻方法具有结构简单、节能、环保等优势。
Abstract
Arrangements of point light sources array with 365 nm ultraviolet LED and focusing lens are designed and optimized. Area light source with uniform illumination and high intensity is achieved based on arrangements system. Lithography experiment with contact exposure method is realized with the optimized area optical source. Lithographic patterns are consistent with mask. The lithography method based on uniform area optical source from 365 nm LED arrays has advantages of simple structure, energy conservation and environmental protection.
王向贤, 汪波, 傅强, 陈漪恺, 胡继刚, 张斗国, 明海. 均匀辐照365 nm LED光源设计及其在光刻中的应用[J]. 中国激光, 2012, 39(4): 0416001. Wang Xiangxian, Wang Bo, Fu Qiang, Chen Yikai, Hu Jigang, Zhang Douguo, Ming Hai. Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography[J]. Chinese Journal of Lasers, 2012, 39(4): 0416001.
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