应用光学, 2012, 33 (1): 30, 网络出版: 2012-03-30
光学合成孔径成像技术的uv覆盖与孔径排列研究
Study on uv coverage of optical synthetic aperture imaging technology and optimization of aperture
长基线 干涉阵排列 uv覆盖 蒙特卡洛 光学合成孔径 long baseline array configuration uv coverage Monte Carlo optical synthetic aperture
摘要
从地平坐标系和时角坐标系出发，运用坐标旋转公式推导出光学合成孔径成像技术中干涉阵排列和uv覆盖之间的几何关系式，以特定观测天区为例，在南京模拟三孔径Y型阵，并运用蒙特卡洛法对2个目标函数分别优化，将其优化结果进行比较,找到比较适合该文的目标函数。
Abstract
Based on the horizon coordinate system and angle coordinate system, the formula between interferometric array and uv coverage of optical synthetic aperture imaging was derived using coordinate rotation. An Y-type in Nanjing was taken as an example to make the observation in a specific sky area, and the Monte Carlo method was used to optimize two objective functions, and the optimization results were compared to find more suitable objective function.
林燮佳, 吴桢. 光学合成孔径成像技术的uv覆盖与孔径排列研究[J]. 应用光学, 2012, 33(1): 30. LIN Xie-jia, WU Zhen. Study on uv coverage of optical synthetic aperture imaging technology and optimization of aperture[J]. Journal of Applied Optics, 2012, 33(1): 30.
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