利用脉冲激光沉积技术在Ti6Al4V(TC4)合金表面制备了羟基磷灰石(HA)薄膜，研究了退火温度对薄膜组织和性能的影响。采用扫描电子显微镜(SEM)、能谱仪(EDS)、X射线衍射(XRD)和傅里叶红外光谱(FTIR)等分析手段对热处理前后薄膜的表面形貌、成分和组织结构进行了分析；采用轮廓仪、接触角测量仪分别对热处理前后薄膜的表面粗糙度和润湿性进行了测量。实验结果表明，利用脉冲激光沉积技术制备的HA薄膜致密、无缺陷，主要由非晶相组成。热处理后的薄膜结晶度提高、表面粗糙度增大，Ca/P比更接近于HA，具有更好的表面亲水性。但是过高的热处理温度(700 ℃)会导致薄膜中微裂纹的出现。

Pulsed laser deposition is used to prepare hydroxyapatite (HA) thin films onto Ti6Al4V (TC4) substrate, and the influence of the annealing temperature on the microstructure and properties is investigated. The morphology, composition and microstructure of the HA films are detected by the scanning electron microscope (SEM), the energy disperse spectroscopy (EDS), X-ray diffraction and the Fourier transform infrared (FTIR) spectroscopy, respectively. The surface roughness and wettability are investigated separately by the profilometer and the contact angle measurement. The experimental results demonstrat that the as-deposited film is compact and defect-free, which is mainly composed of amorphous phase. After heat treatment, the film has a higher crystallinity and roughness, and the ratio of Ca/P is closer to that of HA, and the surface becomes more hydrophilia compared with the bare substrate and the as-deposited one. However, the exorbitant annealing temperature (700 ℃) can result in microcracks on the film.