针对数字投影光刻技术大面积图形曝光的需求，提出了一种基于灰度模板调制的图形拼接方法，包括图形分割、模板设计、子图形灰度调制、子图形曝光4个步骤。图形曝光前，需要将曝光图形分割为多帧大小为1024 pixel×768 pixel的多个子图形，然后每个子图形与对应模板相乘，实现曝光子图形的预处理。基于数字微镜(DMD)对灰度图形的调制原理，设计了可行的边界灰度调制模板。给出了图形分割的基本方法以及模板设计的原则。计算机仿真实验展示了图形拼接的过程。实验结果表明，该方法能较好地解决大面积图形曝光存在的拼接问题，改善了图形刻蚀的质量。

For the requirement of large area graphic exposure of digital projection photolithography, a graphic matching method is proposed based on grayscale mask modulation, which includes graphic segment, mask design, sub-graphic grayscale modulation and sub-graphic exposure. Before graphic inscription, the exposure graphics are segmented into many sub-graphics of size 1024 pixel×768 pixel, then every sub-graphic is multiplied by corresponding mask for the realization of exposure graphics′ pretreatment. Feasible edge grayscale masks are designed according to the principle of digital micromirror device (DMD) modulation for grayscale graphic. The basic method of graphic segment and principle of masks design are given in this paper. The computer simulation experiment shows the process of graphics matching. The results show that matching problems in large area graphic inscription can be solved properly using this method. Besides, the quality of graphic inscription using this method is effectively improved.