Chinese Optics Letters, 2012, 10 (9): 090501, Published Online: May. 16, 2012
Fabrication and characterization of sliced multilayer transmission grating for X-ray region Download: 609次
050.1950 Diffraction gratings 310.1860 Deposition and fabrication 340.7480 X-rays, soft x-rays, extreme ultraviolet (EUV)
Abstract
To develop high quality dispersion optics in the X-ray region, the sliced multilayer transmission grating is examined. Dynamical diffraction theory is used to calculate the diffraction property of this volume grating. A WSi2/Si multilayer with a d-spacing of 14.3 nm and bi-layer number of 300 is deposited on a superpolished silicon substrate by direct current magnetron sputtering technology. To make the transmission grating, the multilayer is sliced and thinned in the cross-section direction to a depth of 23–25 \mu m. The diffraction efficiency of the grating is measured at E = 8.05 keV, and the 1st-order efficiency is 19%. The sliced multilayer grating with large aspect ratio and nanometer period can be used for high efficiency and high dispersion optics in the X-ray region.
Qiushi Huang, Haochuan Li, Jingtao Zhu, Xiaoqiang Wang, Zhanshan Wang, Lingyan Chen, Yongjian Tang. Fabrication and characterization of sliced multilayer transmission grating for X-ray region[J]. Chinese Optics Letters, 2012, 10(9): 090501.