激光技术, 2012, 36 (3): 379, 网络出版: 2012-05-22   

激光直写制备薄膜铂电阻技术研究

Direct laser writing of thin platinum film resistors
作者单位
电子科技大学 光电信息学院,成都 610054
摘要
为了研究激光直写技术在制备薄膜铂电阻中的应用,采用激光直写制备了薄膜厚度为2μm的铂电阻。探讨了激光直写技术制备薄膜铂电阻的原理,以条形铂电阻为例,研究了激光参量对铂电阻形状的影响,在最优的激光脉冲频率18kHz、激光扫描速率100mm/s的参量下,制备了实际电阻约为0.37Ω的条形薄膜铂电阻,最后检验了薄膜铂电阻的电阻值。结果表明,铂电阻的宽度分别随激光脉冲频率和激光扫描速率的增大而增大;制备的电阻边缘整齐,表面平整,电阻实际值与理论值只有0.8%的相对误差,吻合很好。
Abstract
In order to study the application of laser direct writing technology in the fabrication of thin platinum film resistors, platinum resistors in 2μm thick were manufactured by means of laser direct writing. The fabrication mechanism of thin platinum film resistors was discussed. Taking strip platinum resistors as an example, the effect of the laser parameters on the figures of platinum resistors was studied. A 0.37Ω strip thin platinum film resistor was manufactured under the condition that the optimal laser pulse repetition frequency was 18kHz and the laser scanning speed was 100mm/s. Finally, the resistance of the platinum resistors was tested. The results indicate that the width of platinum resistor increases with the increase of laser pulse frequency and the increase of laser scan frequency independently. The edge of the manufactured resistor is neat and the surface is smooth. The relative deviation of the actual resistance to the theoretical one is only 0.8%.

吴波, 吴云峰, 匡艳. 激光直写制备薄膜铂电阻技术研究[J]. 激光技术, 2012, 36(3): 379. WU Bo, WU Yun-feng, KUANG Yan. Direct laser writing of thin platinum film resistors[J]. Laser Technology, 2012, 36(3): 379.

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